产品详细信息
Manufacturing process of molybdenum sputtering target:
http://www.zzstc.com/Molybdenum-Machining-Parts/molybdenum-sputtering-target.html
Molybdenum sputtering target is made of molybdenum by pressing, sintering, machining and flaw detecting.
Molybdenum sputtering target applications:
Molybdenum sputtering target can be applied in vacuum coating industry, X ray tube, ion sputtering, flat panel display industry and photovoltaic industry. Molybdenum sputtering target can be used as thin-film solar cell electrode, wiring material and barrier layer material of semiconductor.
Characteristics and specifications of molybdenum target:
Molybdenum sputtering target has excellent characteristics of molybdenum, such as high melting point, high electrical conductivity, shiny surface, better corrosion resistance and outstanding environmental protection.
Purity(%) Density(g/cm3) Specifications(mm)
≥99.95 ≥9.9 Round target size: (60-100)dia*(42-55)width
Sheet target size: (8-16)thk*(80-200)width*length
Tube target size: (70-90.5)outer dia*（7-20）thk*length
more molybdenum products:http://www.zzstc.com/Molybdenum/
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